Idea For Pilot-Scale Clean-Room Platform
Designed for semiconductor fabs and industrial R&D, this 22 L dual-frequency bath handles wafer cassettes, optics modules, slurry mixing and dispersion, and multi-rack sample trays. 40 kHz removes oil, solder flux, and photoresist residues; 120 kHz polishes micro-vias, fibre bundles, and print-head nozzles. Sixteen piezo stacks produce up to 800 W adjustable output, backed by a 1000 W heater. Three-mode cavitation control (degas cycle, pulse cleaning, sweep freq) delivers unmatched throughput and consistency. Low-outgassing construction, silent insulation (< 85 dB), and global certifications ensure seamless clean-room integration and worldwide deployment.
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