19L Triple-Frequency Ultrasonic Bath, 40/80/120kHz, Adjustable Power 0–800W

30L Multi-Frequency Cleaner: High Power Large Capacity for Busy Lab Environments

Engineered for heavy-duty lab operations, the 30L ultrasonic cleaner with 40/80/120kHz frequencies excels at removing tenacious contaminants like oil, graphite debris, wax, and biofilms. Its degas function purges dissolved gases from solutions, enhancing ultrasonic efficiency, while the sweep mode eliminates cleaning dead zones during large-scale processing. The pulse mode delivers powerful bursts to break down compact residues.

Featuring digital controls for temperature (ranging from 20–80℃) and timing (1–9999s), a durable SUS304 tank (size 50x30x20cm), and a secure mesh basket, this cleaner ensures both functionality and longevity. Certified to CE, RoHS, and FCC standards, it is well-suited for OEM bulk orders and continuous high-volume use, making it a reliable workhorse for any bustling research facility.

Specification:

Box Contents:

1 x Professional Ultrasonic Cleaner
1 x Durable Mesh Cleaning Basket
One cover, one power cord, one manual warranty card certificate of conformity.

Packing type:

One unit filled with thick foam, then standard export corrugated carton or wooden box.

More Units

40/80/120kHz Triple Frequency Series

Heater 20–80°C · Timer 1–9999s · SUS304 Unit

30L Series

Heater 20–80°C · Timer 1–9999s · SUS304 Unit

YL Ultrasonic Bath Features

Engineered as a versatile high-capacity ultrasonic solution for pilot-scale research, this 30L triple-frequency ultrasonic system combines robust performance with precision cleaning capabilities. Boasting 16 industrial-grade transducers (50W each) that deliver 800W of combined power across 40/80/120kHz frequencies, the platform enables fast turnaround for multi-sample processing, graphite block decontamination, and wafer cassette preparation(Recommended 200kHz frequency ultrasonic cleaning machine). The 40kHz mode tackles heavy-duty grease and debris on industrial components, while 80kHz balances cleaning efficiency with material safety for biological residue removal. Meanwhile, the 120kHz setting achieves sub-micron level precision in blind holes and slits, critical for advanced semiconductor R&D and nano-particle dispersion.

Key functional modules enhance operational flexibility: Pulse mode disrupts tenacious organic deposits, Sweep frequency eliminates cavitation dead zones in dense loadouts, and Degas cycles prime solvents for optimal ultrasonic transfer. A digital control interface allows precise adjustment of timing (1–9999s) and temperature (20–80℃), while the robust SUS304 stainless steel tank withstands continuous use in rigorous lab environments. Trusted by research teams for batch-scale processing under strict process controls, this CE-certified system serves as an all-in-one platform for applications ranging from graphite block maintenance to advanced microchannel cleaning in semiconductor manufacturing.