3.2L 200kHz Ultrasonic Cleaner for Silicon Wafers & Chips | Lab Precision Cleaning Machine

Product Features:

• 6 x 200kHz 25 Watts Transducers – 150 Watts Efficient
• Generous 3.2L Tank Capacity & Dimensions 24×13.5x10cm
• 1 – 9999s Digital Time Setting
• Heating Function Room Temperature – 80℃ Range
• Secure Wire Cleaning Mesh Basket
• Yunyisonic ultrasonic cleaner meets CE + RoHS + FCC (“Limit the use of certain hazardous substances”) standards and comes with a 1-year “Free Parts” warranty

Specification:

Box Contents:

1 x Professional Ultrasonic Cleaner
1 x Durable Mesh Cleaning Basket
One cover, one power cord, one manual warranty card certificate of conformity.

Packing type:

One unit filled with thick foam, then standard export corrugated carton or wooden box.

More Unit

200kHz Series

Heater 20–80°C · Timer 1–9999s · SUS304 Unit

3.2L Series

Heater 20–80°C · Timer 1–9999s · SUS304 Unit

Multi Mode

Degas Mode

Removes dissolved gases to improve cavitation performance

Pulse Mode

Burst cleaning power via pulsed ultrasonic intensity

Sweep Mode

Minimizes standing wave zones and ensures uniform cleaning throughout the tank.

Noise Reduction

Optimized for quiet operation <85dB via full-bridge circuitry and sound insulation layers.

Typical Applications

• Silicon wafers, semiconductor chips, and microchip wafers cleaning
• MEMS, microfluidic, and photonic device processing
• Ultra-fine labware, optical glass, sensor, and medical research tools
• Precision pre-treatment and residue removal for R&D and pilot-scale production

Scientific R&D Application Scenarios

1. Ultrasound Assisted Biological Sample Processing
2. Ultrasound Assisted Cleaning Lab Equipment and Medical Surgical Instruments
3. Ultrasound Assisted Extraction (UAE) of Natural Pigment and Spice and Food Colorants
4. Ultrasound Assisted Catalytic Activation
5. Ultrasound Assisted Synthesis
6. Ultrasound Assisted Environmental Solutions

Ultrasonic Frequency Range and Applications: A Scientific Guide

Low-Frequency Range (17kHz–28kHz)

Characteristics: Long wavelengths generate large, uneven cavitation bubbles with high collapse energy, enabling aggressive mechanical action.
Key Applications:

• 20kHz–25kHz:

  • Wastewater treatment (degradation of organic pollutants, algae inhibition/removal).

  • Dispersion of large-particle powders (e.g., ceramics, composites).

  • Emulsion extraction and hard-to-degrade organic substance treatment (e.g., PFAS, dyes).

• 28kHz:

  • Heavy-duty cleaning (rust, grease, carbonized deposits in industrial parts).

  • Pretreatment of metallurgical samples or mechanical components.

Mid-Frequency Range (33kHz–40kHz)

Characteristics: Balanced bubble density and collapse force, offering versatility for routine lab and industrial use.
Key Applications:

• 33kHz–38kHz:

  • Standard lab glassware cleaning (e.g., beakers, pipettes).

  • Catalysis acceleration and solvent degassing.

  • Homogenization of suspensions (e.g., cell cultures, nanomaterials).

• 40kHz:

  • General-purpose commercial/household cleaning (jewelry, electronics).

  • Intermediate precision tasks (PCB cleaning, medical instrument sterilization).

High-Frequency Range (68kHz–200kHz)

Characteristics: Short wavelengths produce dense, uniform microbubbles with gentle collapse forces, minimizing surface damage.
Key Applications:

• 68kHz–80kHz:

  • Microstructure cleaning (fuel injectors, MEMS devices).

  • Penetration of micron-scale blind holes (e.g., 3D-printed parts).

• 120kHz–200kHz:

  • Nanofabrication & Precision Optics:

    • Wafer and photomask cleaning (sub-µm particle removal).

    • Synthesis of nanomaterials (e.g., quantum dots, liposomes).

  • Biotech & Pharma:

    • Cell lysis for intracellular content extraction.

    • Gentle dispersion of nanodrug carriers.